GaAs/AlGaAs/InGaAs Vertical Triple Barrier Single Electron Transistors
- 1 March 1997
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 36 (3S)
- https://doi.org/10.1143/jjap.36.1667
Abstract
A gated vertical sub-micron triple barrier structure with undoped Al0.22Ga0.78As barriers and I n 0.05 G a 0.95 A s wells is used to study the properties of two weakly coupled quantum dots containing just a few electrons. We find that the conductance peaks become sparse as the ac excitation voltage is decreased when there is considerable mismatch between the ladders of energy levels in the two dot. Concurrently, the diamond shaped regions of Coulomb blockade are strongly disrupted. On the other hand, when the mismatch between energy levels is “small”–comparable to or less than the level width–the evolution of conductance peaks in pairs in the presence of a magnetic field applied parallel to the tunneling current is clearly seen and this can be related to spin-degeneracy.Keywords
This publication has 9 references indexed in Scilit:
- Shell Filling and Spin Effects in a Few Electron Quantum DotPhysical Review Letters, 1996
- A new design for submicron double-barrier resonant tunnelling transistorsSemiconductor Science and Technology, 1996
- Single-electron phenomena in semiconductorsSemiconductor Science and Technology, 1996
- Sub-Micron Vertical AlGaAs/GaAs Resonant Tunneling Single Electron TransistorJapanese Journal of Applied Physics, 1995
- Stochastic Coulomb blockade in a double quantum dotApplied Physics Letters, 1994
- Variable-area resonant tunneling diodes using implanted in-plane gatesJournal of Applied Physics, 1994
- Stochastic Coulomb blockade in a double-dot systemPhysical Review B, 1992
- Vertical transport in Schottky-gated, laterally confined double-barrier quantum well heterostructuresSurface Science, 1992
- Gated resonant tunnelling devicesElectronics Letters, 1991