Etching of 6H‐SiC and 4H‐SiC using NF 3 in a Reactive Ion Etching System

• 1 May 1996
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 143  (5) , 1750-1753
• https://doi.org/10.1149/1.1836711

Abstract