Electrodeposited Nickel-Iron Thin Films
- 1 August 1963
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 2 (8)
- https://doi.org/10.1143/jjap.2.451
Abstract
Magnetic properties of nickel-iron thin films electrodeposited onto copper substrates have been experimentally studied. (1) The coercive force H c takes the minimum value at the film composition about 81.5Ni–18.5Fe. The squareness ratio B r/B s of Fe-rich films is very close to 1, while that of Ni-rich films decreases with an increase of nickel concentration. (2) The coercive force H c is proportional to d -n for the 71∼88%Ni–Fe films, 1200 to 14000 Å thick. The exponent n takes a constant value in Fe-rich regions, while the value gradually decreases with an increase of nickel concentration passing through 81.5Ni–18.5Fe. (3) The uniaxial anisotropy is remarkably affected by the geometrical states of the surface of the substrates. The relation between the composition of nickel-iron films and the depositing conditions has also been studied. The depositing conditions to prepare the film having a minimum H c are described.Keywords
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