Semi-empirical modelling of SiO/sub 2/ chemical-mechanical polishing planarization
- 9 December 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Planarization of ULSI Topography over Variable Pattern DensitiesJournal of the Electrochemical Society, 1991