New evaporation method of high-melting-temperature materials utilizing a vacuum discharge
- 1 May 1976
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 28 (9) , 481-482
- https://doi.org/10.1063/1.88827
Abstract
By utilizing a discharge caused between electrodes (specimens) in a high vacuum (≃2×10−5 Torr) and without inert gas, the evaporation of high‐melting‐temperature materials (W, Ta, and C) has been successfully achieved. The main part of the instrument was composed of two electrodes (0.8–1.5 mmφ) and a helical filament (0.8–1 mmφ, 10 turns). An alternating voltage was supplied between electrodes (sparking gap: 0.5–2 mm), and in order to get sparking easily, the electrodes were preheated by bombarding with electrons (emission: 500 μA) from the filament. After starting, the high voltage was lowered to a range of 1–2 kV and the filament fell in disuse. Then the discharge was maintained stably. The structure of 600‐Å‐thick W films deposited by this method was mostly of the ordered W3W.Keywords
This publication has 3 references indexed in Scilit:
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