Pass - a chalcogenide-based lithography scheme for I.C. fabrication
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 1341-1344
- https://doi.org/10.1016/s0022-3093(05)80372-2
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High-resolution electron beam lithography with negative organic and inorganic resistsJournal of Vacuum Science & Technology B, 1988
- Photo-induced structural and physico-chemical changes in amorphous chalcogenide semiconductorsPhilosophical Magazine Part B, 1985
- Submicron optical lithography using an inorganic resist/polymer bilevel schemeJournal of Vacuum Science and Technology, 1980