Formation Process and Electrical Property of RuO2 Thin Films Prepared by Reactive Sputtering
- 1 June 1998
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 37 (6R)
- https://doi.org/10.1143/jjap.37.3457
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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