Beam monitoring system for simultaneous measurement of near and far field patterns in high repetition rate KrF lasers
- 1 September 1989
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 28 (17) , 3775-3778
- https://doi.org/10.1364/ao.28.003775
Abstract
A computer-controlled beam monitoring system for KrF excimer lasers was developed for simultaneous measurement of near and far field patterns and pointing stability of the laser beam at a 250 Hz repetition rate. The system and results obtained are described.Keywords
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