Etching of In2O3:Sn and In2O3:Te thin films in dilute HCl and H3PO4
- 1 August 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 141 (2) , L87-L89
- https://doi.org/10.1016/0040-6090(86)90361-5
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Transparent conductors—A status reviewThin Solid Films, 1983
- Transparent gate silicon photodetectorsIEEE Transactions on Electron Devices, 1978
- Etching methods for indium oxide/tin oxide filmsThin Solid Films, 1976
- Transparent conductive Sn‐doped indium oxide coatings deposited by reactive sputtering with a post cathodeJournal of Vacuum Science and Technology, 1976
- Properties of Sn‐Doped In2 O 3 Films Prepared by RF SputteringJournal of the Electrochemical Society, 1975