Difference between Blocking and Néel Temperatures in the Exchange BiasedSystem
Top Cited Papers
- 26 June 2000
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 84 (26) , 6102-6105
- https://doi.org/10.1103/physrevlett.84.6102
Abstract
The blocking temperature has been determined as a function of the antiferromagnetic layer thickness in the exchange biased system. For CoO layers thinner than 50 Å, is reduced below the Néel temperature of bulk CoO (291 K), independent of crystallographic orientation or film substrate ( , , and MgO). Neutron diffraction studies show that does not track the CoO ordering temperature and, hence, that this reduction in does not arise from finite-size scaling. Instead, the ordering temperature of the CoO layers is enhanced above the bulk for layer thicknesses due to the proximity of magnetic layers.
Keywords
This publication has 24 references indexed in Scilit:
- Exchange anisotropy — a reviewJournal of Magnetism and Magnetic Materials, 1999
- Exchange biasJournal of Magnetism and Magnetic Materials, 1999
- Consequences of Spin-Flop Coupling in Exchange Biased FilmsPhysical Review Letters, 1998
- Calculations of Exchange Bias in Thin Films with Ferromagnetic/Antiferromagnetic InterfacesPhysical Review Letters, 1997
- Distribution of blocking temperature in bilayered Ni81Fe19/NiO filmsJournal of Applied Physics, 1994
- Mechanisms of exchange anisotropy (invited)Journal of Applied Physics, 1988
- Simple model for thin ferromagnetic films exchange coupled to an antiferromagnetic substrateJournal of Applied Physics, 1987
- Temperature dependence of unidirectional anisotropy effects in the Permalloy-FeMn systemsJournal of Applied Physics, 1982
- New Magnetic AnisotropyPhysical Review B, 1957
- New Magnetic AnisotropyPhysical Review B, 1956