Substrate floating potential characteristics in planar magnetron and ht sputtering systems
- 1 January 1980
- Vol. 30 (7) , 267-274
- https://doi.org/10.1016/s0042-207x(80)80038-8
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Mean free path of negative ions in diode sputteringJournal of Vacuum Science and Technology, 1978
- 16. Design and operating characteristics of low pressure plasma systemsVacuum, 1978
- Effect of secondary electrons and negative ions on sputtering of filmsJournal of Vacuum Science and Technology, 1976
- The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—I. Target processesVacuum, 1972