Boron nitride thin films on Si(100) by metal organic chemical vapour deposition
- 31 July 1993
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 87 (1) , 67-70
- https://doi.org/10.1016/0038-1098(93)90538-x
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Ab initio study of the formation of aminoborane from ammonia and diboraneThe Journal of Physical Chemistry, 1992
- High-pressure phases of boron nitride grown by laser-assisted plasma chemical vapor deposition from BCl3+NH3+H2+ArJournal of Applied Physics, 1991
- Plasma enhanced chemical vapor deposition and characterization of boron nitride gate insulators on InPJournal of Applied Physics, 1991
- Cubic boron nitride crystallites grown by laser-enhanced plasma chemical vapour depositionJournal of Physics D: Applied Physics, 1991
- Synthesis of Cubic Boron Nitride from Boron Nitride Synthesized by Pressure Pyrolysis of BorazineJournal of the American Ceramic Society, 1990
- Preparation of cubic boron nitride film by activated reactive evaporation with a gas activation nozzleJournal of Vacuum Science & Technology A, 1987
- Preparation and characterization of thin protective films in silica tubes by thermal decomposition of hexachloroborazineJournal of the Less Common Metals, 1981
- Beiträge zur Chemie des Bors, I. Darstellung und Eigenschaften der Alkylamin‐borane, R3-nHnN.BH3European Journal of Inorganic Chemistry, 1960
- The Preparation of Trimethylamine-borine, N-Trimethylborazole and N-DimethylaminoborineJournal of the American Chemical Society, 1949