Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature
- 1 July 1989
- journal article
- letter
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 66 (1) , 447-449
- https://doi.org/10.1063/1.343846
Abstract
Hydrogenated amorphous carbon (a‐C:H) films were prepared at room temperature by low‐frequency (50‐Hz) plasma chemical vapor deposition using CH4 and H2 . The a‐C:H films were transparent, highly resistive, and very uniform. Infrared absorption measurements, as well as Raman spectroscopy, indicated that the C bonding in the a‐C:H films was predominantly sp3 . Moreover, the optical band gap of the a‐C:H films was measured.This publication has 8 references indexed in Scilit:
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