Low pressure and temperature deposition of transparent conductive indium tin oxide (ITO) films by the face target sputtering (FTS) process
- 1 February 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 224 (1) , 105-111
- https://doi.org/10.1016/0040-6090(93)90466-3
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- High Conducting Large Area Indium Tin Oxide Electrodes for Displays Prepared by DC Magnetron SputteringJapanese Journal of Applied Physics, 1991
- Evaporated Sn-doped In2O3 films: Basic optical properties and applications to energy-efficient windowsJournal of Applied Physics, 1986
- Properties of tin doped indium oxide thin films prepared by magnetron sputteringJournal of Applied Physics, 1983
- Transparent conductors—A status reviewThin Solid Films, 1983
- Thin metallic oxides as transparent conductorsThin Solid Films, 1982
- Preparation of conducting and transparent thin films of tin-doped indium oxide by magnetron sputteringApplied Physics Letters, 1980
- Transparent Conducting CoatingsAnnual Review of Materials Science, 1977
- Chemical Vapor Deposition at Low TemperaturesJournal of the Electrochemical Society, 1975
- Production and Properties of Transparent Electroconductive Coating on Polyester FilmJapanese Journal of Applied Physics, 1974
- Untersuchungen an halbleitenden IndiumoxydschichtenPhysica Status Solidi (b), 1966