Organosilicon chemistry. Part II. The thermal decomposition of hexamethyldisilane, the Me₃Si–SiMe₃bond dissociation energy, and the ionisation potential of the trimethylsilyl radical

1 January 1967

journal article
research article
Published by Royal Society of Chemistry (RSC) in J. Chem. Soc. A

p. 768-771
https://doi.org/10.1039/j19670000768

Abstract

The thermal decomposition of hexamethyldisilane has been studied in a flow system connected to a mass spectrometer to give the bond dissociation energy D(Me₃Si–SiMe₃)= 49 ± 6 kcal. mole^–1. This value has been combined with a measured appearance potential to give a new value of the ionisation potential of the trimethylsilyl radical, I.P. (Me₃Si)= 7·93 ± 0·3 eV.

Keywords

THERMAL DECOMPOSITION
HEXAMETHYLDISILANE
IONISATION POTENTIAL
TRIMETHYLSILYL RADICAL

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Organosilicon chemistry. Part II. The thermal decomposition of hexamethyldisilane, the Me3Si–SiMe3bond dissociation energy, and the ionisation potential of the trimethylsilyl radical

Abstract

Keywords

Organosilicon chemistry. Part II. The thermal decomposition of hexamethyldisilane, the Me₃Si–SiMe₃bond dissociation energy, and the ionisation potential of the trimethylsilyl radical