Etching of thin SiO2 layers using wet HF gas

• 1 May 1989
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 7  (3) , 1719-1723
• https://doi.org/10.1116/1.576033

Abstract

Keywords

• HF GAS ETCHING
• SILICON
• LAYERS
• REMOVAL
• SIOX