A Comparison of Electron-Gas SNMS, RBS and AES for the Quantitative Depth Profiling of Microscopically Modulated Thin Films
- 1 January 1986
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High resolution sputter depth profiling of implantation structures in Si by low energy SNMSJournal of Vacuum Science & Technology A, 1985
- High-resolution sputter depth profiling with a low pressure hf plasmaApplied Physics A, 1979
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961