Characteristics of a dual purpose cathodic arc/magnetron sputtering system
- 5 December 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 43-44, 288-298
- https://doi.org/10.1016/0257-8972(90)90082-n
Abstract
No abstract availableKeywords
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- Die glimmentladung bei niedrigem druck zwischen koaxialen zylindern in einem axialen magnetfeldPhysica, 1936