Microbeam RBS and PIXE applied to microelectronics
- 1 April 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 24-25, 635-637
- https://doi.org/10.1016/s0168-583x(87)80213-6
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Microbeam imaging at micron and submicron resolutionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- Multidimensional ion microbeam analysisNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- Comparison of N P N transistors fabricated with broad beam and spatial profiling using focused beam ion implantationJournal of Vacuum Science & Technology B, 1986
- Algorithms for the rapid simulation of Rutherford backscattering spectraNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Materials characterization with a He+ microbeamNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- RBS analysis with a 1 μ beamJournal of Vacuum Science & Technology B, 1985
- An achromatic quadrupole lens doublet for positive ionsApplied Physics Letters, 1982