Effects of Postdeposition Annealing Treatments on Charge Trapping in CVD Al[sub 2]O[sub 3] Films on Si
- 1 January 1973
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 120 (12) , 1707
- https://doi.org/10.1149/1.2403349
Abstract
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