A fine line silicon shadow mask for inversion layer solar cells
- 1 March 1981
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 2 (3) , 61-63
- https://doi.org/10.1109/edl.1981.25341
Abstract
The feasibility of using silicon shadow masks to delineate fine linewidth grid patterns in MIS - Inversion Layer solar cells has been demonstrated. The masks have been prepared by anisotropically etching V-grooves into one surface of a silicon wafer, while simultaneously thinning the wafer by etching from the back surface. These masks have been used in a simple procedure to fabricate MISIL solar cells on 2.5 Ωcm, Czochralski silicon substrates with active area conversion efficiencies up to 15.1%.Keywords
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