High power 13.3 Å x-ray source for submicron lithography

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Abstract
This paper discusses the design, fabrication, and performance of a high‐power x‐ray source for submicron x‐ray lithography. The source is a conventional x‐ray source featuring a high perveance (1.0×10−6 A V−3/2) electron gun and a water cooled high‐speed rotating anode (8000 rpm). The anodematerial is copper and the main characteristic line radiated is the Cu L line of 13.3 Å wavelength. Details are given on the geometrical design of the source, the realization of the pure Tantalumcathode indirectly heated by electron bombardment, and the high‐speed rotating anode. Results will be given on the operating conditions of the source as well as on the x‐ray exposure of high resolution x‐ray masks.

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