In situ measurement of the metalorganic and hydride partial pressures in a MOCVD reactor using ultraviolet absorption spectroscopy
- 2 November 1989
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 98 (3) , 293-301
- https://doi.org/10.1016/0022-0248(89)90144-9
Abstract
No abstract availableKeywords
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