CVD of SrBi2Ta2O9(SBT) Thin Film from Bi(CH3)3 - Sr[Ta(O·C2H5)6]2 - O2 System

• 1 June 1999
• journal article
• Published by Trans Tech Publications, Ltd. in Key Engineering Materials
• Vol. 169-170, 145-148
• https://doi.org/10.4028/www.scientific.net/kem.169-170.145

Abstract

Keywords

• BI(CH3)3
• CHEMICAL VAPOR DEPOSITION (CVD)
• SR[TA(O·C2H5)6]2
• SRBI2TA2O9