Structural characterization of Ta/Al multilayer films

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Abstract
Ta/Al multilayer films with modulation wavelength 4.6 and 9.5 nm were fabricated by magnetron sputtering. The structure of the multilayer was studied by x-ray diffraction. The combination of Ta and Al forms a metallic superlattice with Ta(110) and Al(111) textures. The x-ray diffraction patterns were simulated using the model for the modulated composition multilayer. The coherence length perpendicular to the film is about 100 nm. The composition modulation is approximately a trapezoidal wave. The thickness of the transition layer is about 1.00 nm for the multilayer with a modulation wavelength of 4.6 nm. The fluctuation of atomic planes in each period is about 5%.