Low-voltage triode sputtering with a confined plasma. Part II: Plasma characteristics and energy transport
- 1 September 1975
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science and Technology
- Vol. 12 (5) , 1058-1066
- https://doi.org/10.1116/1.568462
Abstract
The plasma characteristics of a triode low-voltage sputtering (LVS) system have been measured. The current–voltage relationships in the confined plasma discharge, of the target and of the substrate table, have been investigated as a function of pressure for Ar and Xe, with and without an axial magnetic field. The power dissipation and steady-state temperature at the target and substrate table were also measured as a function of operating conditions. From these measurements the plasma potential and target current densities could be deduced. The application of these results to sputter deposition is considered.Keywords
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