Abstract
The plasma characteristics of a triode low-voltage sputtering (LVS) system have been measured. The current–voltage relationships in the confined plasma discharge, of the target and of the substrate table, have been investigated as a function of pressure for Ar and Xe, with and without an axial magnetic field. The power dissipation and steady-state temperature at the target and substrate table were also measured as a function of operating conditions. From these measurements the plasma potential and target current densities could be deduced. The application of these results to sputter deposition is considered.

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