The Kinetics of Oxygen Loss and Thermal Donor Formation in Silicon at Temperatures between 350°C and 500°C
- 1 October 1993
- journal article
- Published by Trans Tech Publications, Ltd. in Materials Science Forum
- Vol. 143-147, 963-968
- https://doi.org/10.4028/www.scientific.net/msf.143-147.963
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: