Transient interferometric technique for measuring thermal expansion at high temperatures: Thermal expansion of tantalum in the range 1500?3200 K
- 1 September 1982
- journal article
- Published by Springer Nature in International Journal of Thermophysics
- Vol. 3 (3) , 259-288
- https://doi.org/10.1007/bf00503321
Abstract
No abstract availableKeywords
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