A conductive organic film, ammonium poly(p‐styrene sulfonate) (AmPSS) and conductive two‐layer resist systems using AmPSS are described. Conductive two‐layer resist systems consist of silicon‐containing negative resist (SNR) (Toyo Soda) as the top imaging layer and AmPSS as the conductive bottom layer. SNR/AmPSS two‐layer resist systems eliminate the charging effects in electron beam lithography.