Formation of silicon dioxide films in acidic solutions
- 1 January 1991
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 48-49, 405-408
- https://doi.org/10.1016/0169-4332(91)90364-p
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- A New Process for Silica CoatingJournal of the Electrochemical Society, 1988
- Comparison of properties of dielectric films deposited by various methodsJournal of Vacuum Science and Technology, 1977