An in situ study of the reactive ion beam etching of tungsten with tetrafluoromethane/argon mixtures using ion scattering spectroscopy and secondary ion mass spectrometry
- 1 May 1990
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 8 (3) , 1685-1689
- https://doi.org/10.1116/1.576830
Abstract
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