Range and Standard Deviation of Ion-Implanted Phosphorus in Silicon

• 1 July 1974
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 13  (7) , 1187-1188
• https://doi.org/10.1143/jjap.13.1187

Abstract

Keywords

• STANDARD DEVIATION
• PHOSPHORUS IN SILICON
• DEVIATION OF ION
• ION IMPLANTED PHOSPHORUS