Preparation of high-aspect ratio periodic corrugations by plasma and ion etching
- 1 August 1976
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 15 (8) , 1905_1-1906
- https://doi.org/10.1364/ao.15.1905_1
Abstract
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This publication has 13 references indexed in Scilit:
- Profile and groove-depth control in GaAs diffraction gratings fabricated by preferential chemical etching in H2SO4-H2O2-H2O systemApplied Physics Letters, 1976
- cw operation of distributed-feedback GaAs-GaAlAs diode lasers at temperatures up to 300 KApplied Physics Letters, 1975
- GaAs-GaAlAs distributed-feedback diode lasers with separate optical and carrier confinementApplied Physics Letters, 1975
- Room-temperature operation of low-threshold separate-confinement heterostructure injection laser with distributed feedbackApplied Physics Letters, 1975
- Single-heterostructure distributed-feedback GaAs-diode lasersIEEE Journal of Quantum Electronics, 1975
- GaAs–Ga1−xAlxAs double-heterostructure distributed-feedback diode lasersApplied Physics Letters, 1974
- Distributed-feedback single heterojunction GaAs diode laserApplied Physics Letters, 1974
- Ion Beam Micromachining of Integrated Optics ComponentsApplied Optics, 1973
- Ion-Beam Techniques for Device FabricationJournal of Vacuum Science and Technology, 1971
- STIMULATED EMISSION IN A PERIODIC STRUCTUREApplied Physics Letters, 1971