Growth of diamond film by a plug-flow flat flame method
- 1 May 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 212 (1-2) , 127-132
- https://doi.org/10.1016/0040-6090(92)90509-a
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
- High growth rate diamond synthesis in a large area atmospheric pressure inductively coupled plasmaJournal of Materials Research, 1990
- Growth of diamond films on silicon from an oxygen-acetylene flameApplied Physics Letters, 1990
- Combustion synthesis of diamondSurface and Coatings Technology, 1989
- Diamond coating of a long substrate by use of a combustion flameSurface and Coatings Technology, 1989
- Low-temperature diamond deposition by microwave plasma-enhanced chemical vapor depositionApplied Physics Letters, 1989
- Diamond synthesis using an oxygen-acetylene torchMaterials Letters, 1988
- Large Area Chemical Vapour Deposition of Diamond Particles and Films Using Magneto-Microwave PlasmaJapanese Journal of Applied Physics, 1987
- Properties of Diamondlike Carbon FilmsMRS Proceedings, 1986
- Growth of diamond thin films by electron assisted chemical vapor depositionApplied Physics Letters, 1985
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982