Iteratively derived optical constants of MoO3 polycrystalline thin films prepared by CVD
- 1 July 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 304 (1-2) , 39-44
- https://doi.org/10.1016/s0040-6090(97)00092-8
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Characterization and Stability of Electrochromic MoO3 Thin Films Prepared by ElectrodepositionJournal of the Electrochemical Society, 1995
- Electro-deposition of films of electrochromic tungsten oxide containing additional metal oxidesElectrochimica Acta, 1993
- Refinement on the Structure of GeO2 Glass by the Least-Squares Variational Method Coupled with the Anomalous X-Ray Scattering DataHigh Temperature Materials and Processes, 1992
- Determination of optical constants of thin film from reflectance spectraApplied Optics, 1990
- Structure and optical properties of MoO3 thin films prepared by chemical vapor depositionPhysica Status Solidi (a), 1988
- Etude des propriétés optiques et de la structure de couches minces électrochromes de WO3 préparées par CVDRevue de Physique Appliquée, 1988
- Inversion of normal-incidence (R,T) measurements to obtain n + ik for thin filmsApplied Optics, 1986
- Absorption Bands of Electrochemically-Colored Films of WO3, MoO3 and MocW1-cO3Japanese Journal of Applied Physics, 1984
- Electrochromic materials and devices for energy efficient windowsSolar Energy Materials, 1984
- Optical Properties and Electronic Structure of Amorphous GermaniumPhysica Status Solidi (b), 1966