Electrical and optical properties of in situ “hydrogen-reduced” titanium dioxide thin films deposited by pulsed excimer laser ablation
- 1 August 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 248 (2) , 234-239
- https://doi.org/10.1016/0040-6090(94)90017-5
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Theoretical model for deposition of superconducting thin films using pulsed laser evaporation techniqueJournal of Applied Physics, 1990
- Process conditions for deposition of good quality thin films of Y1Ba2Cu3O7−x superconductor on ZrO2, SrTio3 and Si/ZrO2 substrates by XeC1 pulsed excimer laser ablationSolid State Communications, 1990
- Deposition of iron oxide thin films by pulsed laser evaporationApplied Physics Letters, 1988
- Electrical conductance of crystalline TinO2n-1for n=4-9Journal of Physics C: Solid State Physics, 1983
- The Metal-Insulator Transition in Selected OxidesAnnual Review of Materials Science, 1975
- Thermogravimetric studies of the defect structure of rutile (TiO2)Journal of Physics and Chemistry of Solids, 1962
- Protons, dipoles, and charge carriers in rutile in rutileJournal of Physics and Chemistry of Solids, 1962
- Über den Leitungsmechanismus oxydischer Halbleiter bei hohen TemperaturenZeitschrift für Naturforschung A, 1959
- On the Defect Structure of Rutile.Acta Chemica Scandinavica, 1959
- Electrical and Optical Properties of Rutile Single CrystalsPhysical Review B, 1952