SPE-CoSi2submicrometer lines by lift-off using selective reaction and its application to a permeable-base transistor
- 1 March 1986
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 33 (3) , 322-327
- https://doi.org/10.1109/t-ed.1986.22490