Ion-assisted deposition with a new plasma source
- 7 July 1991
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 140, 523-527
- https://doi.org/10.1016/0921-5093(91)90473-z
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ion-assisted deposition of lanthanum fluoride thin filmsApplied Optics, 1987
- III Optical Films Produced by Ion-Based TechniquesPublished by Elsevier ,1986
- Ion-beam-assisted deposition of thin filmsApplied Optics, 1983
- Technology and applications of broad-beam ion sources used in sputtering. Part I. Ion source technologyJournal of Vacuum Science and Technology, 1982