Spectroscopic investigations into plasma used for nitriding processes of steel and titanium
- 1 August 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 230 (2) , 115-120
- https://doi.org/10.1016/0040-6090(93)90502-g
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- R.F. plasma nitriding of Ti6A14V alloyThin Solid Films, 1990
- Plasma and nitrides: application to the nitriding of titaniumPublished by Walter de Gruyter GmbH ,1990
- Nitriding of stainless steel in an rf plasmaJournal of Applied Physics, 1989
- Nitriding mechanisms in ArN2, ArN2H2 and ArNH3 mixtures in D.C. Glow discharges at low pressures (less than 10 Torr)Materials Science and Engineering, 1987
- Preparation of silicon nitride films at room temperature using double-tubed coaxial line-type microwave plasma chemical vapor deposition systemJournal of Applied Physics, 1987
- Thermochemical surface treatment of titanium and titanium alloy Ti6Al4V by low energy nitrogen ion bombardmentMaterials Science and Engineering, 1985
- Nitriding of titanium in an r.f. discharge II: Effect of the addition of hydrogen to nitrogen on nitridingJournal of the Less Common Metals, 1982
- Nitriding of titanium in a radio frequency dischargeJournal of the Less Common Metals, 1977
- Role of nitrogen atoms in ``ion-nitriding''Journal of Applied Physics, 1974
- Study of ion-nitridingJournal of Applied Physics, 1973