Investigation of Defects in High-Resistivity Undoped CdTe Using the EBIC Method
- 1 September 1986
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 25 (9A) , L780
- https://doi.org/10.1143/jjap.25.l780
Abstract
The Electron Beam Induced Current (EBIC) method using an aluminum Schottky barrier was applied to high-resistivity undoped CdTe crystals to obtain images of crystal defects. The defects such as cellular dislocation structures and twins were observed to produce distributions of dark spots in EBIC images. When the crystals were etched with PBr etchant, it was found that the etched patterns corresponded to high intensity regions in the EBIC images.Keywords
This publication has 7 references indexed in Scilit:
- Properties of CdTe crystals grown by THM using Cd as the solventJournal of Crystal Growth, 1985
- Structural properties of crystals of CdTe grown from the vapour phaseJournal of Crystal Growth, 1985
- Growth of CdTe crustals by the vertical bridgman techniqueJournal of Crystal Growth, 1985
- Charge collection scanning electron microscopyJournal of Applied Physics, 1982
- Sublimation growth and x-ray topographic characterization of CdTe single crystalsJournal of Crystal Growth, 1980
- Observation of dislocations in cadmium telluride by cathodoluminescence microscopyApplied Physics Letters, 1979
- Etch Pits and Polarity in CdTe CrystalsJournal of Applied Physics, 1962