Lateral spread of boron ions implanted in silicon
- 15 August 1972
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 21 (4) , 128-129
- https://doi.org/10.1063/1.1654311
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Theoretical Considerations on Lateral Spread of Implanted IonsJapanese Journal of Applied Physics, 1972