A molecular dynamics analysis of low energy atom—surface interaction during energetic deposition of silver thin films
- 1 April 1992
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 51 (1-3) , 324-327
- https://doi.org/10.1016/0257-8972(92)90258-c
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Molecular-dynamics simulation of the energetic deposition of Ag thin filmsPhysical Review B, 1991
- Surface relaxation of α-iron and the embedded-atom methodPhysical Review B, 1990
- Dynamics and structure of energetic displacement cascadesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- Growth of silicon homoepitaxial thin films by ultrahigh vacuum ion beam sputter depositionJournal of Vacuum Science & Technology B, 1986
- Embedded-atom-method functions for the fcc metals Cu, Ag, Au, Ni, Pd, Pt, and their alloysPhysical Review B, 1986
- Embedded-atom method: Derivation and application to impurities, surfaces, and other defects in metalsPhysical Review B, 1984
- Ion MixingAnnual Review of Materials Science, 1983
- Epitaxial growth of Ag deposited by ion deposition on NaClJournal of Vacuum Science and Technology, 1976