Process, design and characterization of ion implanted bubble devices
- 1 November 1981
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 17 (6) , 2914-2916
- https://doi.org/10.1109/tmag.1981.1061493
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Effects of Conductor Stress on Bubble Propagation in Contiguous Disk DevicesJournal of the Electrochemical Society, 1980
- Design of Bubble Device Elements Employing Ion-Implanted Propagation PatternsBell System Technical Journal, 1980
- Self-aligned contiguous-disk chip using 1µm bubbles and charged-wall functionsIEEE Transactions on Magnetics, 1979
- Some characteristics of ion-implanted bubble chipsIEEE Transactions on Magnetics, 1979