Application of Ion-Induced X-Ray Emission for the Measurement of Stopping Powers
- 1 February 1979
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nuclear Science
- Vol. 26 (1) , 1323-1325
- https://doi.org/10.1109/tns.1979.4330379
Abstract
The method for measuring the stopping power of materials for charged particles using ion-induced x-ray emission is described in detail, and the results for 100-keV protons on yttrium and samarium are presented to exemplify the method. By utilizing a lithium-drifted silicon detector, the thickness and uniformity of the stopping film can be monitored simultaneously with the collection of stopping power data. In addition, it will be shown that the incorporation of a backscattering spectrometer with the ion-induced x-ray system can yield two independent measurements of the energy loss in the stopping film, and at the same time detect impurities that might be present in the film.Keywords
This publication has 4 references indexed in Scilit:
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