Probing reactive deposition and surface dynamics using in situ, real-time emission microscopy
- 1 May 1995
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 13 (3) , 1517-1521
- https://doi.org/10.1116/1.579718
Abstract
Emission microscopy images of surface processes during chemical vapor deposition and catalytic reactions show a number of dynamic reaction phenomena that illustrate problems suitable for observation with the emission microscope: nucleation and growth of adsorbed layers, adsorbate controlled diffusion from the bulk, pattern formation, melting and evaporation. A qualitative examination of deposit morphology is made and is compared to the formation of Liesegang rings.This publication has 0 references indexed in Scilit: