Mechanical characterization of membranes for x-ray lithography masks

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Abstract
This paper presents experimental results on the mechanical properties of x-ray mask substrates. Relevant mechanical properties were determined using an automatic system which plots membrane deformation versus applied differential pressure. In the system, the substrate is held in a leak-tight chuck, and a differential pressure is applied across the membrane by compressed nitrogen. The resulting bulging of the membrane is measured with a laser gauge. The results obtained allow determination of the Young’s modulus, mechanical hysteresis, tension, and fracture strength of x-ray lithography mask membranes. Relatively thin (1–7 μm) membranes of different geometries, and of several materials including B-doped Si and boro–hydro–nitride were characterized. In addition, data that shed light on the role of polyimide coatings on the mechanical integrity of the membranes are presented.

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