Low Energy Ion Implantation / Deposition as a Film Synthesis and Bonding Tool
- 1 January 1993
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 40 references indexed in Scilit:
- Joining of Metal Films to Carbon-Carbon Composite Material by Metal Plasma Immersion Ion ImplantationMRS Proceedings, 1993
- Pressure ionization: its role in metal vapour vacuum arc plasmas and ion sourcesPlasma Sources Science and Technology, 1992
- Integrated ion flux emitted from the cathode spot region of a diffuse vacuum arcJournal of Physics D: Applied Physics, 1992
- Properties of tetrahedral amorphous carbon prepared by vacuum arc depositionDiamond and Related Materials, 1991
- Theory of the expanding plasma of vacuum arcsJournal of Physics D: Applied Physics, 1991
- Characterization of composite carbon coatings deposited by dc cathodic arc techniqueJournal of Materials Research, 1991
- Model of plasma source ion implantation in planar, cylindrical, and spherical geometriesJournal of Applied Physics, 1990
- Principles and applications of vacuum arc coatingsIEEE Transactions on Plasma Science, 1989
- Thin Film ProcessesJournal of the Electrochemical Society, 1980
- Components of cathode erosion in vacuum arcsJournal of Physics D: Applied Physics, 1976