In-Situ Oxygen Monitoring of Rapid Thermal Process Chamber: Diagnosis of Gas Flow Dynamics and Wafer Processing
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
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This publication has 1 reference indexed in Scilit:
- Ambient Gas Effects on the Reaction of Titanium with SiliconJournal of the Electrochemical Society, 1985