Laser writing of quantum well intermixed GaInAsP/InP microstructures

Abstract
Laser-induced intermixing of quantum well (QW) and barrier material has been studied in GaInAsP/InP laser heterostructures grown by chemical beam epitaxy. Samples were exposed to CW Nd:YAG laser radiation for 7.5 to 300 sec with power densities in the range of 3 to 9 W/mm2. With a laser beam tightly focused on the surface, this approach has the potential to `write' lines of arbitrary shapes of quantum well intermixed material. A 90 nm blue shift of the QW PL peak was demonstrated in the material processed with a triple pass of the 7.5 W/mm2 laser beam. This result has been achieved with a writing speed of 20 micrometers /s. The influence of laser power, dwell time per pass and total irradiation time of the Nd:YAG laser beam on the extent of the blue shift and the optical properties of GaInAsP-based quantum well structures were investigated.

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