A study of electron beam evaporated SiO2, TiO2, and Al2O2 films using RBS, HFS, and SIMS
- 1 January 1990
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 45 (1-4) , 664-668
- https://doi.org/10.1016/0168-583x(90)90921-g
Abstract
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